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The oxidation of PtSi, Pt2Si and polycrystalline silicon in ultrahigh vacuum residual gas

โœ Scribed by H.C. Swart; C.W. Louw; G.L.P. Berning


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
282 KB
Volume
158
Category
Article
ISSN
0040-6090

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