𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The optimum heavy ion beam for the compositional analysis of indium nitride films

✍ Scribed by Santosh K. Shrestha; Heiko Timmers

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
239 KB
Volume
249
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Argon ion beam voltages influence the mi
Argon ion beam voltages influence the microstructure of aluminum nitride films in a dual ion beam sputtering system
✍ Hong-Ying Chen; Sheng Han; Han C. Shih πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 138 KB

Aluminum nitride (AlN) films, using a dual ion beam sputtering, were prepared over the argon ion beam voltage ranging from 800 to 1200 V at room temperature. The AlN films were (0 0 2) and (1 0 0) planes. Excepting for operating at 1000 V, the AlN films exhibited the (0 0 2) preferred orientation. T