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The nanoindentation response of systems with thin hard carbon coatings

✍ Scribed by S.V. Hainsworth; T. Bartlett; T.F. Page


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
456 KB
Volume
236
Category
Article
ISSN
0040-6090

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## Abstract A self‐assembled monolayer (SAM) of fluoroalkyl silane (FAS) (CF~3~(CF~2~)~5~(CH~2~)~2~SiCl~3~) was deposited on the surface of silicon wafers, aiming to enhance its stability and to reduce the inflammatory response in the central nervous system. Following implantation of the FAS SAM co