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The modelling routes for the chemical vapour deposition process: application to Si1−xGex deposition

✍ Scribed by M. Pons; C. Bernard; H. Rouch; R. Madar

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 708 KB
Volume: 91
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(95)00091-7

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