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On the modelling of transport phenomena in chemical vapour deposition and its use in reactor design and process optimization

✍ Scribed by C.R. Kleijn

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 747 KB
Volume: 206
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(91)90391-a

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