The mechanism of oxidation of thin Ni−Cr films

✍ Scribed by I.E. Klein; M. Hershkovich; I.A. Goldberg

• Publisher: Elsevier Science
• Year: 1988
• Tongue: English
• Weight: 264 KB
• Volume: 19
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(88)80005-3

✦ Synopsis

Thin films of Ni-Cr were electron-beam-evaporated and subsequently annealed in air or in vacuum. Their depth profile was analysed by Auger electron spectroscop~. The film/substrata and the film/air interfaces were studied in order to shed light on contributing factors to adhesion and the mechanism of oxidation (termed resistor stabilisation in the microelectronics trade).