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The mechanical and structural properties of Ti films prepared by filtered arc deposition

✍ Scribed by A Bendavid; PJ Martin; GB Smith; L Wielunski; TJ Kinder


Book ID
107869026
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
948 KB
Volume
47
Category
Article
ISSN
0042-207X

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Ti-49.5 at%Ni thin films have been formed by deposition onto Si and glass substrates using a filtered arc deposition system (FADS). The films deposited on glass were composed of nanocrystalline parent phase grains contained within an amorphous matrix. The films deposited onto silicon were crystallin