The kinetics of thin film island growth at initial stages

✍ Scribed by E. Urbonavičius; E. P≐tnyčyt≐; A. Galdikas

• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 101 KB
• Volume: 53
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(98)00344-3

✦ Synopsis

The simulation of the early stages of thin film formation is performed using a phenomenological approach considering the surface diffusion of the adatoms and the migration of islands. The model describes the kinetics of low surface coverage as well as of higher surface coverage. The effects of atom evaporation and island dissociation are not included in this model. The variation of the phenomenological coefficients gives the possibility to obtain the time dependence of the main characteristics such as surface coverage, island density and average island size describing initial stages of the film growth. The surface roughening during deposition can also be considered by the proposed model. The calculated curves are in good qualitative and quantitative agreement with the experimental results.