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The Influences of H2Plasma Pretreatment on the Growth of Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition

✍ Scribed by Sheng-Rui Jian; Yuan-Tsung Chen; Chih-Feng Wang; Hua-Chiang Wen; Wei-Ming Chiu; Chu-Shou Yang

Book ID: 107470272
Publisher: Springer-Verlag
Year: 2008
Tongue: English
Weight: 500 KB
Volume: 3
Category: Article
ISSN: 1931-7573
DOI: 10.1007/s11671-008-9141-5

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