The influence of the growth rate on the preferred orientation of magnetron-sputtered Ti–Al–N thin films studied by in situ x-ray diffraction

✍ Scribed by M. Beckers; N. Schell; R. M. S. Martins; A. Mücklich; W. Möller

• Book ID: 121847823
• Publisher: American Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 910 KB
• Volume: 98
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1999829