The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—II. Transport and deposition processes

✍ Scribed by L Holland; CRD Priestland

• Publisher: Elsevier Science
• Year: 1972
• Tongue: English
• Weight: 785 KB
• Volume: 22
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(72)90310-7