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The influence of SiO[sub x] and SiN[sub x] passivation on the negative bias stability of Hf–In–Zn–O thin film transistors under illumination

✍ Scribed by Park, Joon Seok; Kim, Tae Sang; Son, Kyoung Seok; Lee, Kwang-Hee; Maeng, Wan-Joo; Kim, Hyun-Suk; Kim, Eok Su; Park, Kyung-Bae; Seon, Jong-Baek; Choi, Woong; Ryu, Myung Kwan; Lee, Sang Yoon


Book ID
125886187
Publisher
American Institute of Physics
Year
2010
Tongue
English
Weight
525 KB
Volume
96
Category
Article
ISSN
0003-6951

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