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The Influence of Resistance of the Epitaxial-Film Volume on the Capacity-Voltage Characteristics of the HgCdTe/AOF and HgCdTe/SiO2/Si3N4MIS Structures

✍ Scribed by A. V. Voitsekhovskii; S. N. Nesmelov; S. M. Dzyadukh

Publisher: Springer
Year: 2005
Tongue: English
Weight: 415 KB
Volume: 48
Category: Article
ISSN: 1573-9228
DOI: 10.1007/s11182-005-0174-2

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