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The influence of oxidation rate and heat treatment on the Si surface potential in the Si-SiO2 system : A. G. Revesz and K. H. Zaininger. IEEE Transactions on Electron DevicesED-13, No. 12 (February 1966), p. 246


Book ID
113190438
Publisher
Elsevier Science
Year
1966
Tongue
English
Weight
106 KB
Volume
5
Category
Article
ISSN
0026-2714

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