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The influence of deposition parameters on the performance of tin dioxide NO2 sensors prepared by radio-frequency magnetron sputtering

โœ Scribed by Geraint Williams; Gary S.V. Coles


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
517 KB
Volume
25
Category
Article
ISSN
0925-4005

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โœฆ Synopsis


Gas-sensitive tin oxide films of varying thickness prepared by a two-step metal-film deposition/thermal-oxidation technique respond selectively to low levels of NO, in the presence of high reducing-gas concentrations. Optimization studies show that an increase in film thickness leads to increased hydrogen cross-sensitivity while the oxidizing-gas response remains relatively constant for all the sensors tested. Hence short sputter times favour selective NO2 detection. In comparison, reactively sputtered films of comparable thickness exhibit significantly higher reducing-gas sensitivity under the same conditions.


๐Ÿ“œ SIMILAR VOLUMES


Tin dioxide thin-film gas sensor prepare
โœ L. Bruno; C. Pijolat; R. Lalauze ๐Ÿ“‚ Article ๐Ÿ“… 1994 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 405 KB

Tin dioxide films are elaborated by a chemical vapour deposition (CVD) method. An accurate control of deposition parameters (temperature, total pressure, duration) so that appropriate annealing conditions (duration, temperature) can be used to modify the structural properties of the films : grain si