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The impact of phase and amplitude errors on an etched diffraction grating demultiplexer

โœ Scribed by Hongqiao Wen; Dongqing Pang; Zexuan Qiang

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
560 KB
Volume
236
Category
Article
ISSN
0030-4018

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โœฆ Synopsis

The insertion loss and channel crosstalk of an etched diffraction grating (EDG) demultiplexer is significantly influenced by phase and amplitude errors. A statistical model to estimate the impact of phase and amplitude errors in an EDG is developed using scalar diffraction theory. The numerical results show that the influence of amplitude errors caused by nonuniformity in deposition and etching process is not distinct until the resolution of photomask is better than 40 nm. A basic requirement for an EDG demultiplexer with crosstalk less than )30 dB is given.

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