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The image of a line width test object in a scanning electron microscope with different energies of the probe electrons

✍ Scribed by Ch. P. Volk; V. B. Mityukhlyaev; Yu. A. Novikov; A. V. Rakov; P. A. Todua

Publisher
Springer US
Year
2009
Tongue
English
Weight
161 KB
Volume
52
Category
Article
ISSN
0543-1972

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The lithographic effect of electron beam on poly(methyl methacrylate) in a scanning electron microscope: Minimization of line width by the dose and beam current
✍ M. MuchovΓ‘; Z. Pelzbauer πŸ“‚ Article πŸ“… 1989 πŸ› John Wiley and Sons 🌐 English βš– 388 KB πŸ‘ 2 views

The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on