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The formation and decomposition of water and hydrogen on Gex Si1−x(100)2 × 1

✍ Scribed by J.A. Schaefer; J.Q. Broughton; J.C. Bean; H.H. Farrell


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
488 KB
Volume
39
Category
Article
ISSN
0368-2048

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The low-temperature adsorption and decomposition of digermane on Si( 100) has been investigated by ultraviolet photoelectron spectroscopy. Exposure of Ge2H, to Si ( 100) at 110 K results in molecular adsorption and ab initio calculations of gas phase Ge2H6 are used to help interpret the low temperat