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The film growth process in the bias sputtering of superconducting Nb3Ge

✍ Scribed by Akira Terada; Kiko Nakamura; Hidefumi Asano


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
788 KB
Volume
115
Category
Article
ISSN
0040-6090

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Effects of deposition parameters on the
✍ T. Asano; Y. Tanaka; K. Tachikawa πŸ“‚ Article πŸ“… 1985 πŸ› Elsevier Science 🌐 English βš– 300 KB

The eHects ol cle,,posili(.;n parameters; cm the synthesis ol Nb:.~Ge on the chemical vapour clepositi(in process have been studied. The chlorides, NbCI 5 and GeCI 4, prepared by m sttu chlorlnallun were used The NL~Ge him wa~ depuslled orl a Haslelluy X lal:)e which muved Ihrough a lubular reacllon