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The evolution of the ion implantation damage in device processing

✍ Scribed by M. L. Polignano; I. Mica; V. Bontempo; F. Cazzaniga; M. Mariani; A. Mauri; G. Pavia; F. Sammiceli; G. Spoldi

Publisher: Springer US
Year: 2008
Tongue: English
Weight: 346 KB
Volume: 19
Category: Article
ISSN: 0957-4522
DOI: 10.1007/s10854-008-9630-4

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