The epitaxial ZrO2 on silicon as alternative gate dielectric: film growth, characterization and electronic structure calculations

✍ Scribed by S.J. Wang; Y.F. Dong; C.H.A. Huan; Y.P. Feng; C.K. Ong

• Book ID: 108215146
• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 221 KB
• Volume: 118
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2004.12.023