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The epitaxial growth and properties of p-type silicon on spinel using a dual-rate deposition technique

✍ Scribed by G.E. Gottlieb

Publisher: Elsevier Science
Year: 1972
Tongue: English
Weight: 674 KB
Volume: 12
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(72)90305-3

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📂 Article 📅 1967 🏛 Elsevier Science 🌐 English ⚖ 240 KB