The electrical properties of porous anodic Al2O3 films with copper deposited in the pores
โ Scribed by R.D. Gould
- Publisher
- Elsevier Science
- Year
- 1982
- Tongue
- English
- Weight
- 412 KB
- Volume
- 89
- Category
- Article
- ISSN
- 0040-6090
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
A kinetic study on the growth of porous anodic Al,O, films on Al metal, anodized galvanostatically at current densities 5-75mAcm-' in a stirred 15% w/v H,SO, bath solution at bath temperatures 204OYZ, was performed. A strict kinetic model was formulated which was, nevertheless, rather complex. There
## Ahstrati-Porous anodic Al,4 flhns were investigated for their behaviour during hydrothermal treatment in H,O at 100ยฐC and a mechanism for the process of oxide hydration was proposed. The films were prepared galvanostatically in a 15% w/v HsSO, bath at 20, 25 and 30ยฐC and at 5, 15 and 35 mA cm-'
The mechanism of growth of porous anodic AI,O, films at various bath temperatures, current densities and H,SO, concentrations was studled for tiims produced in a vigorously stirred bath at anodization times higher than those at which the maximum pore diameter behind or at film surface approaches fir