The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH 4 /NH 3 /N 2 plasmas: Two-dimensional simulations

✍ Scribed by Liu, Xiang-Mei; Song, Yuan-Hong; Jiang, Wei; Yi, Lin

• Book ID: 121343841
• Publisher: IOP Publishing
• Year: 2013
• Tongue: English
• Weight: 937 KB
• Volume: 22
• Category: Article
• ISSN: 1674-1056
• DOI: 10.1088/1674-1056/22/4/045204