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The effects of ion implantation upon nickel oxidation investigated by secondary ion mass spectrometry

โœ Scribed by P.J. George; M.J. Bennett; H.E. Bishop; G. Dearnaley

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
529 KB
Volume
116
Category
Article
ISSN
0921-5093

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Diffusion behavior of implanted Li ions
Diffusion behavior of implanted Li ions in GaN thin films studied by secondary ion mass spectrometry
โœ F. Salman; L. Chow; B. Chai; F.A. Stevie ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 210 KB

Lithium ions with dosages of 2.6 ร‚ 10 12 , 2.6 ร‚ 10 13 , 2.6 ร‚ 10 14 , and 2.6 ร‚ 10 15 cm ร€2 have been implanted into a GaN thin film grown on sapphire substrates. The diffusion behavior of these implanted Li ions in GaN thin film at different temperature anneals was studied using secondary ion mass