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The Effect of Substrate Temperature on the Properties of Nanostructured Silicon Carbide Films Deposited by Hypersonic Plasma Particle Deposition

✍ Scribed by J. Blum; N. Tymiak; A. Neuman; Z. Wong; N.P. Rao; S.L. Girshick; W.W. Gerberich; P.H. McMurry; J.V.R. Heberlein

No coin nor oath required. For personal study only.

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