The Effect of Electromagnetic Retardation on the Rupture Process of a Very Thin Liquid Film
โ Scribed by Chi-Chuan Hwang; Te-Chih Ke; Chaur-Kie Lin; Chih-Woei Shiau
- Publisher
- Elsevier Science
- Year
- 1999
- Tongue
- English
- Weight
- 80 KB
- Volume
- 219
- Category
- Article
- ISSN
- 0021-9797
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โฆ Synopsis
Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a flat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T LM is larger than the nonlinear rupture time T NM , but the gradient of T LM to D is comparable to that of T NM .
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