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The effect of diffusion, reaction order, and developer selectivity on the performance of positive DUV resists

✍ Scribed by T.H. Fedynyshyn; J.W. Thackeray; J.M. Mori

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 544 KB
Volume: 23
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)90164-3

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