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The Effect of Contact Window Cleaning and Doping in BF3+ H2and BF3+ H2+ CF4Plasmas on the Mo–p+-Si Contact Resistance

✍ Scribed by Yu. P. Snitovskii; S. F. Sen'ko

Book ID
110307741
Publisher
Springer
Year
2001
Tongue
English
Weight
33 KB
Volume
30
Category
Article
ISSN
1063-7397

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