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The effect of argon pressure, residual oxygen and exposure to air on the electrical and microstructural properties of sputtered chromium thin films

✍ Scribed by Ali Foroughi-Abari; Can Xu; Kenneth C. Cadien

Book ID: 113937227
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 851 KB
Volume: 520
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.08.063

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## Abstract Transparent thin films of amorphous zinc indium tin oxide were prepared at room temperature by co‐sputtering of zinc oxide and indium tin oxide. Effect of oxygen partial pressure on the optical and electrical properties of amorphous zinc indium tin oxide thin films were investigated. Co