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The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA

✍ Scribed by Peng Wang; Xia Wang; Youming Chen; Guangan Zhang; Weimin Liu; Junyan Zhang


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
689 KB
Volume
253
Category
Article
ISSN
0169-4332

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