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The effect of adsorbed and recoil-implanted oxygen on sputtered excited atoms

โœ Scribed by I.S.T. Tsong; S. Tsuji


Publisher
Elsevier Science
Year
1980
Weight
48 KB
Volume
94
Category
Article
ISSN
0167-2584

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The effect of dose and temperature on th
โœ N. Hatzopoulos; R. Chater; U. Bussmann; P.L.F. Hemment; J.A. Kilner ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 385 KB

The effect of implantation temperature and oxygen dose on the structure of as-implanted separation by implantation of oxygen (SIMOX) wafers was studied by means of Rutherford backscattering spectrometry and ion channelling, secondary ion mass spectrometry and cross-sectional transmission electron mi