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The dynamics of hot F atoms in low pressure plasma etching reactors

✍ Scribed by Bernie Shizgal; Andrew S. Clarke

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 844 KB
Volume: 166
Category: Article
ISSN: 0301-0104
DOI: 10.1016/0301-0104(92)80092-a

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