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The damage recovery and electrical activation of shallow boron implants in silicon: The effects of high energy implants

โœ Scribed by K. Kyllesbech Larsen; V. Privitera; S. Coffa; F. Priolo; C. Spinella; M. Saggio; S.U. Campisano


Book ID
113287270
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
534 KB
Volume
112
Category
Article
ISSN
0168-583X

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