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The current understanding of epitaxial silicon doping in the light of modelling and theory development (VI) autodoping as a special mode of dopant incorporation

✍ Scribed by Dr. H. Kühne

Publisher
John Wiley and Sons
Year
1988
Tongue
English
Weight
547 KB
Volume
23
Category
Article
ISSN
0232-1300

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\_ ~\_ \_ \_ \_ ~ H. KUHNE akadernie dcr Wissenschaften der DDR Institut fur Halbleiterphysik. Frankfurt (Oder) The Current Understanding of Epitaxial CVD Silicon Layer Doping in the Light of Modelling and Theory Development (IV) The Problem of More-than-one Kind of Dopant Species In Part I V of the