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The Characteristics of Interfacial Strains Developed in Silicon by Wet O2 Oxidation

✍ Scribed by D.-W. Shin; Y.-H. You; D.-J. Choi; G.-H. Kim

Book ID: 110239362
Publisher: Springer
Year: 1999
Tongue: English
Weight: 75 KB
Volume: 18
Category: Article
ISSN: 0261-8028
DOI: 10.1023/a:1006664429348

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