The atomic-scale removal mechanism during chemo-mechanical polishing of Si(100) and Si(111)

✍ Scribed by G.J. Pietsch; Y.J. Chabal; G.S. Higashi

• Book ID: 116067211
• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 559 KB
• Volume: 331-333
• Category: Article
• ISSN: 0039-6028
• DOI: 10.1016/0039-6028(95)00292-8