✦ LIBER ✦
Role of polycation adsorption in poly-Si, SiO2 and Si3N4 removal during chemical mechanical polishing: Effect of polishing pad surface chemistry
✍ Scribed by Naresh K. Penta; John B. Matovu; P.R. Dandu Veera; Sitaraman Krishnan; S.V. Babu
- Book ID
- 113550130
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 705 KB
- Volume
- 388
- Category
- Article
- ISSN
- 0927-7757
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