The application of the (n, α) method for boron depth profiling and channeling-blocking measurements in semiconductor materials

✍ Scribed by K. Müller; R. Henkelmann; F. Jahnel; H. Ryssel; K. Haberger; D. Finck; J. Biersack

• Publisher: Elsevier Science
• Year: 1980
• Weight: 468 KB
• Volume: 170
• Category: Article
• ISSN: 0029-554X
• DOI: 10.1016/0029-554x(80)91002-2