The adsorption of methanol on NiOx/Ni{110}: Defect-controlled dissociation

✍ Scribed by H.E. Sanders; P. Gardner; D.A. King

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 509 KB
• Volume: 231
• Category: Article
• ISSN: 0009-2614
• DOI: 10.1016/0009-2614(94)01270-9

✦ Synopsis

The adsorption, desorption and dissociation of methanol on thin film nickel oxide surfaces grown on a Ni{ 1 lo} substrate has been investigated using RAIRS. Two thin film oxides have been prepared at two different temperatures (300 and 570-650 K), referred to as the low-temperature (low 7') and high-temperature (high T) oxides, respectively. At 130 K, methanol adsorbs molecularly on the regular NiO terraces. Molecular desorption occurs at around 250 K indicating weak chemisorption. However, a small concentration of a more strongly bound methoxy species is observed on the surface of the high T oxide at temperatures in excess of 350 K. In direct contrast, no dissociation to methoxy is observed to occur for methanol adsorption on the low T oxide. In an analogous manner to the dissociation of the water molecule on nickel oxide surfaces, it appears that non-lattice oxygen facilitates abstraction of the hydroxyl hydrogen resulting in the formation of adsorbed methoxy.