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The adsorption and reaction of fluorine on the Si(100) surface

✍ Scribed by J.R. Engstrom; Mark M. Nelson; Thomas Engel


Publisher
Elsevier Science
Year
1989
Weight
116 KB
Volume
215
Category
Article
ISSN
0167-2584

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We provide direct theoretical evidence for the existence of a strong coupling between the barrier for H2 dissociation and the structure of the Si( 100) surface. Our arguments are based on an ab initio calculation of the potential energy surface for the dissociation process. While adsorption on the b