Tetrode sputtering system—its performanc
✦ LIBER ✦
Tetrode sputtering system and its application for the deposition of tantalum, silica, and alumina thin films: T Asamaki, Z Oda, H Muta, T Mizonobe, Nippon Electric Co, Kawasaki, Japan
- Publisher
- Elsevier Science
- Year
- 1968
- Tongue
- English
- Weight
- 112 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0042-207X
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