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Temperature dependent Al-induced crystallization of amorphous Ge thin films on SiO2 substrates

✍ Scribed by Toko, Kaoru; Fukata, Naoki; Nakazawa, Koki; Kurosawa, Masashi; Usami, Noritaka; Miyao, Masanobu; Suemasu, Takashi

Book ID: 120570758
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 998 KB
Volume: 372
Category: Article
ISSN: 0022-0248
DOI: 10.1016/j.jcrysgro.2013.03.031

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