We have investigated the vibrational relaxation of the OH impurity stretch mode in amorphous SiO 2. At low temperatures, a short relaxation time of ~-10-l0 s is found that varies strongly across the inhomogeneously broadened absorption line. The inhomogeneous broadening is caused by a site-dependent
Temperature dependence of the vibrational population lifetime of OH(ν = 1) in fused silica
✍ Scribed by E.J. Heilweil; M.P. Casassa; R.R. Cavanagh; J.C. Stephenson
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 640 KB
- Volume
- 117
- Category
- Article
- ISSN
- 0009-2614
No coin nor oath required. For personal study only.
✦ Synopsis
An infrared picosecond transient bleacbmg technique wa_s used LO measure vibrational lifenmes (I;) of hydroxyl groups in fused silica over the temperature range 100-1450 K 7, decreucs from 109 to 15 ps in this range. The 7, remperakure dependence is compared co non-radrative relaxation theory for the decay of the OH( u=l) quamum by a multiphonon mechamsm.
📜 SIMILAR VOLUMES
Picosecond infrared saturation-recovery measurements have been performed on the OH-stretching vibrations (3500-3710 cm-l) of hydroxyl groups located within the octahedral layers of ten naturally occurring crystalline micas. At room temperature, the average OH(u = 1) vibrational population lifetime (
To complete our studies concerning collisional line broadening in the fundamental bands of SO 2 , hydrogen-broadening coefficients for 21 lines from the n 3 band between 1341 and 1357 cm 01 with 8 £ JЉ £ 33, 1 £ KЉ a £ 16, heliumbroadening coefficients for 3 lines from the n 1 band around 1121 cm 01