๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Temperature dependence of the CH+N2 reaction at low total pressure

โœ Scribed by K.H. Becker; B. Engelhardt; H. Geiger; R. Kurtenbach; G. Schrey; P. Wiesen


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
636 KB
Volume
195
Category
Article
ISSN
0009-2614

No coin nor oath required. For personal study only.

โœฆ Synopsis


The reaction CH(X *II) +NZ was studied as a function of temperature in the range 301-894 K at 20 Torr total pressure. CH radicals were generated by excimer laser photolysis of CHClBr*/Ar mixtures and were detected by laser-induced fluorescence. The reaction proceeds along two pathways, below 673 K the rate constants exhibit a negative temperature dependence with an activation energy of -9.57 + 0.32 kJ/mol consistent with an adduct formation followed by collisional stabilization. From the rate constants above 673 K, where the production of HCN+N dominates an activation energy of 53.1 kJ/mol was estimated for the abstraction pathway. A transition state theory model was applied to analyze the experimental results.


๐Ÿ“œ SIMILAR VOLUMES


Pressure and temperature dependence of t
โœ Alan S. Rodgers; Gregory P. Smith ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 581 KB

Canonical RRKM theory has been applied to the two channels of the reaction CH + N 2. The transition state parameters used to describe the system were formulated from theoretical potential energy surface parameters and experimental rate constants. Rate constant expressions are presented for the press

Pressure and temperature dependence of t
โœ Katherine I. Barnhard; Alejandro Santiago; Min He; Federico Asmar; Brad R. Weine ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 511 KB

The temperature (295-374 K) and pressure (2.5-100 Torr) dependences for the rate constant of the C2H,0+N02 reaction have been measured by laser flash photolysis/laser-induced fluorescence kinetic spectroscopy. The temperature-dependent reaction for the decay of CZHsO in the presence of NO1 is charac

Temperature dependence of the reaction o
โœ Fuxiang Wu; Robert W. Carr ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 729 KB

The reaction of NO with the peroxy radical CFC12CH202, and with CH3CFClO2 was investigated at 8-20 torr and 263-321 K by UV flash photolysis of CFCI2CH3/O2/NO gas mixtures The kinetics were determined from observations of the growth rate of the CFC12CH20 radical and the decay rate of NO by time-reso