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Temperature dependence of reactive ion beam etching of GaAs with CH4/H2: J. M. Villalvilla, C. Santos and J. A. Valles-Abarca. Vacuum43(5–7), 591 (1992)


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
113 KB
Volume
33
Category
Article
ISSN
0026-2714

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