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Significance of charge exchange in the determination of yields in broad-beam ion etching : J. M. Villalvilla, C. Santos and J. A. Valles-Abarca. Vacuum39(7/8), 683 (1989)


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
132 KB
Volume
30
Category
Article
ISSN
0026-2714

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