Temperature dependence of boron surface segregation in Si molecular beam epitaxial growth on the Si(111) √3 × √3-B surface

✍ Scribed by Yoshinao Kumagai; Kouichi Ishimoto; Ryosuke Mori; Fumio Hasegawa

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 404 KB
• Volume: 150
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(95)80088-t