This study investigates various approaches to flare mitigation in EUVL. We evaluate the effectiveness of rule-based correction by defining a design where the critical dimension uniformity is used as a measure of the quality of the correction. We also describe the outcome of a model-based correction
β¦ LIBER β¦
Temperature behavior of pellicles in extreme ultraviolet lithography
β Scribed by Hyung-Cheol Lee, Eun-Jin Kim, Ji-Won Kim, Hye-Keun Oh
- Book ID
- 119936953
- Publisher
- The Korean Physical Society
- Year
- 2012
- Tongue
- English
- Weight
- 154 KB
- Volume
- 61
- Category
- Article
- ISSN
- 0374-4884
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
Flare mitigation strategies in extreme u
β
Insung Kim; Alan Myers; Lawrence S. Melvin III; Brian Ward; Gian Francesco Lorus
π
Article
π
2008
π
Elsevier Science
π
English
β 911 KB
4X reduction extreme ultraviolet interfe
β
Isoyan, Artak; WΓΌest, A.; Wallace, John; Jiang, Fan; Cerrina, Franco
π
Article
π
2008
π
Optical Society of America
π
English
β 730 KB
Comparison of Extreme Ultraviolet Source
β
V.Y. Banine; J.P.H. Benschop; H.G.C. Werij
π
Article
π
2000
π
Elsevier Science
π
English
β 362 KB
Multilayer-coating-induced aberrations i
β
Liang, Chen ;Descour, Michael R. ;Sasian, Jose M. ;Lerner, Scott A.
π
Article
π
2001
π
The Optical Society
π
English
β 157 KB
Progress in the development of extreme u
β
Richard. H. Stulen
π
Article
π
1999
π
Elsevier Science
π
English
β 643 KB
Extreme Ultraviolet Lithography (EUV) is viewed by many as the logical extension of current optical lithography which will enable future generations of integrated circuits (ICs) to be printed with feature sizes of 100nm and below. With the completion of the research phase and demonstration of practi
SPIE Proceedings [SPIE SPIE Advanced Lit
β
Lorusso, Gian F.; Davydova, Natalia; Eurlings, Mark; Kaya, Cemil; Peng, Yue; Fee
π
Article
π
2011
π
SPIE
β 245 KB