Flare mitigation strategies in extreme ultraviolet lithography

✍ Scribed by Insung Kim; Alan Myers; Lawrence S. Melvin III; Brian Ward; Gian Francesco Lorusso; Rik Jonckheere; Anne-Marie Goethals; Kurt Ronse

• Book ID: 104051934
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 911 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2008.01.098

✦ Synopsis

This study investigates various approaches to flare mitigation in EUVL. We evaluate the effectiveness of rule-based correction by defining a design where the critical dimension uniformity is used as a measure of the quality of the correction. We also describe the outcome of a model-based correction and the limits of this approach. Finally, we discuss the calculation of accurate full-chip flare maps which are required to implement a rule-based solution. Our results clearly indicate that it is possible to implement an effective flare variation compensation using rule-base correction with current EDA technology, provided that highly accurate full-chip flare maps having the required resolution are available.